MKS Announces Enhanced Etch Sensor for Baratron® Capacitance Manometer Product Line
Delivers improved etch process control for next-generation process nodes
The Enhanced Etch Sensor delivers low-pressure control for next-generation process nodes by providing a 5x decrease in drift associated with fluorine used in etch, including atomic layer etch applications. “Innovation that enables our customers to do more is at the heart of what MKS delivers, and the market leading Enhanced Etch Sensor is evidence of our commitment,” said
Fluorine gas is a corrosive gas commonly used in semiconductor etch processes. At the lower operating pressures associated with next-generation process nodes, fluorine causes a drift that impacts capability and productivity. “Modeling of the sensor based on our knowledge of the etch process was a key factor in the optimization of our sensor development,” said
The Enhanced Etch Sensor continues a rich history of innovation in the Baratron® capacitance manometer product line. Find out more about our product here.
For More Information, contact:
+1 (978) 645-5400 Office
Source: MKS Instruments, Inc.